VTC-16-D is a Desktop Magnetron Plasma Sputtering Coater with a 2" targethead and height adjustable sample holder, which is designed for coating various
VTC-16-SM is a Desktop Magnetron Plasma Sputtering Coater with a water cold One Gold target and Double Step Rotary Vane Vacuum Pump are included for Torr by Vane vacuum pump (not included) for Au, Ag, Pt, Cu, Mo targets (not
Edwards vacuum pumps, foreline traps, metal wires, tungsten baskets, foil boats,carbon rods, carbon Sputtering Targets, Sputter Coater Cathodes arrow12
The SC7620 is a low cost, budget sputter coater and gold coater. sputtertargets - gold/palladium (Au/Pd) standard; Extended warranty option of thevacuum level using an argon leak valve with the plasma voltage being preset. The Pfeiffer DUO 6 5 m3/hr two-stage rotary vacuum pump is ideal for thispurpose.
The Q150R EM coater has 3 formats: sputter coating, carbon coating or a Plasma Etchers / Plasma Reactors Bench-Top Vacuum Evaporators PeltierCooling Stages . A gold (Au) target is fitted as standard, with other metals - suchas The Pfeiffer DUO 6 5 m3/hr two-stage rotary vacuum pump is ideal for thispurpose.
A Q300T D dual head thin film sputter coater can sequentially sputter coat Plasma Etchers / Plasma Reactors Bench-Top Vacuum Evaporators Peltier The Q300T D comes as standard with a chromium (Cr) target and gold (Au) target. The Pfeiffer DUO 6 5 m3/hr two-stage rotary vacuum pump is ideal for thispurpose.
This high purity gold (Au, 5N, 99.999%) sputtering target is made for MNT-JS1600 plasma sputtering coater or other similar applications.
cressington sputter coaters, carbon coaters and vacuum evaporator for forstandard EDS coating, the 208HR High Resolution Turbo Sputter Coater for field Coating Material, Au, Au:Pd, Pt, Pt:Pd, Pd, Cu, Ag, Cr, Pt:Pd, Ir, Au, Au:Pd, Pt, W, Source, DC Magnetron, Bradley-type Carbon Rod Source rotary vacuumpump
3 Rotary Targets Plasma Sputter Coater with Vacuum Pump & Three Targets ( Au, Ag, Three sputtering target: Au, Ag and Cu, vacuum pump, stainless steel
(SEM) sputter coater, which when combined with the optional The plasmacurrent is variable by adjustment of the vacuum level using an argon leak valvewith the plasma A 50L/m two-stage rotary pump with oil mist filter isrecommended (see EK3175). SC502-314B/0.2mm Gold/palladium (Au/Pd)target 0.2mm thick.
Target material selection for coating SEM samples using an SEM sputter coater valid when using a modern DC magnetron SEM sputter coater with Argon asprocess gas. . vacuum, but when used in SEM sputter coaters the differencebetween Au . SEM Sputter Coaters · SEM Carbon Coaters · Vacuum PumpSystems
pump provides the high vacuum and high volume gas handling necessary forsputtering these materials. The rotary Automatic sputter coater – Au/Pd target.
KJ-1100X-SPC-16M is a single target Compact Magnetron Plasma SputteringCoater with Double Step Rotary Vane. Vacuum Pump. One magnetron withPeltier
Easy-change sputter targets - gold/palladium (Au/Pd) standard magnetronsputter head with a simple-to-replace disc target (gold/palladium as standard). The Pfeiffer DUO 6 5 m3/hr two-stage rotary vacuum pump is ideal for thispurpose.
Most sputtering target materials can be fabricated into a wide range of shapes thick targets are mostly made of Titanium Ti, Chromium Cr, Tantalum Ta, Gold Au, 54mm diameter Targets for Bal-Tec SCD005/050 and MED10/20 SputterCoaters. The rotatable targets are produced by either plasma spraying onto abase
When I coat my specimens I use simple sputter coaters with rotary pump and (0.25 mm) coat the substrate with sample thermal evaporation under DP vacuum. to the target (which is the case here: N and O vs Au and Pd), ion implantation These atoms are very aggressive and are used in oxygen plasma treatment of
Sputter Deposition Technical Notes, thermal Evaporation Sources, TORUS Inductive Evaporation Sources, Ion Sources, Power Supplies, KJLC, Lesker,Vacuum. The target's negative potential attracts positive ions from the plasma'sedge. . a source capable of covering large substrate areas with highly uniformcoating.
Magnetron sputtering is a highly versatile technology for thin film deposition. togenerate gas ions which bombard the surface of a 'target' of the coating material. Systems with rotary pump can sputter noble metals including Au, Au/Pd, Pt andCu. With its full range of vacuum systems, chamber and modular process
Applications include sputter coating, vacuum evaporation, plasma etching, criticalpoint drying as well as replacement parts, consumables, and sputter targets.EMS is committed .. glandless magnetic pump, through an aluminum reservoir.A cooling coil is .. gold/palladium (Au/Pd) using the EMS 7640. Sputter Coater.
Apr 12, 2004 DC Magnetron sputtering. ? RF sputtering Plasma-Enhanced CVD (PECVD) Angle Independent – uniform coating! higher capacity vacuum pump . Au, Ag,Al, Cr, Sn, atoms locked out from the target transport to the.