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Physical vapor deposition (PVD) describes a variety of vacuum deposition methods which can be used to produce thin films and coatings. PVD is characterized by a process in which the material goes from a condensed phase to a vapor phase and then back to a thin film condensed phase. The most common PVD
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1 Aug 2017 Physical vapor deposition describes a specific category of thin-film vacuum coating processes. The definition of PVD coating can be broken down as follows: Physical—Individual atoms and molecules are physically liberated from the source of the pure “donor” material, known as the source or target.