DC/RF Dual-Head High Vacuum 2” Magnetron Plasma Sputtering

VTC-600-2HD is a compact magnetron sputtering system with dual 2" targetsources, e.g., one DC source for coating metallic film, and the other RF source for

VTC-16-D

VTC-16-D is a Desktop Magnetron Plasma Sputtering Coater with a 2" targethead and height adjustable sample holder, which is designed for coating various

VTC-16-SM

VTC-16-SM is a High Power Desktop Magnetron Plasma Sputtering Coater witha water cooling 2" target head, water chiller and rotatable sample holder.

Combinatorial Plasma Sputtering Coater with Three 2'' magnetron

Combinatorial Plasma Sputtering Coater with Three 2'' magnetron Singlephase 220 VAC 50 / 60 Hz; 2000 W (including vacuum pump and water chiller).

2" RF Plasma Magnetron Sputtering Coater for Non-Conductive Thin

VTC-2RF is a compact 2“ single head RF Plasma magnetron sputtering system 220 VAC, 50/60Hz, single phase; 800 W (including pump); If the voltage is 110

Plasma Sputtering Coaters

Results 1 - 9 of 9 3 Heads Compact 1" RF Plasma Magnetron Sputtering Coater, with DC DC/RFDual-Head High Vacuum 2” Magnetron Plasma Sputtering

3 Heads Compact 1" RF Plasma Magnetron Sputtering Coater, with

VTC-3RF is a three head 1" RF Plasma magnetron sputtering system Vacuumlevel: 1.0E-2 Torr with included dual stage mechanical pump (Click the picture

4" High Vacuum Magnetron Sputter Source with Quick Connector

The 4-inch high vacuum magnetron sputter source can be used to sputter both DC/RF Dual-Head High Vacuum 2” Magnetron Plasma Sputtering Coater

2" High Vacuum Magnetron Sputter Source with Flexible Head

The HVMSS-SPC-2 is a 2" diam. circular magnetron sputtering gun which can 2" High Vacuum Magnetron Sputter Source with Flexible Head & QuickConnector . DC/RF Dual-Head High Vacuum 2” Magnetron Plasma SputteringCoater

Magnetron sputtering - Penn Engineering

Feb 8, 2012 greater than the ambient pressure, and (ii) those involving ionic sputtering sputter coating is a vacuum process: low pressures are required (i) to .impedance of the plasma to drop and the magnetron source operates at

What is DC Sputtering? - Semicore

Nov 26, 2016 Diagram of the DC Magnetron Sputtering Process The basic configuration of aDC Sputtering coating system is the target material to be used as a coating isplaced in a vacuum chamber parallel to the substrate to be coated. in the -2 to -5 kV range is then applied to the target coating material that is the

Physical Vapor Deposition of Coatings On Glass

Magnetron Sputtering. ? Vacuum Solar energy distribution at sea level for airmass = 2. S p e ctra . plasma created above the target surface. ?Sputter Sputter Coating Machine. Vacuum. Chamber. Vacuum Pumps. Process Gas.Cathode.

Sputtering Systems for Sale | New and Used Equipment - Bid Service

Cold Deposition/Etch Sputter Coater for SEM Sample Preparation. Does not have Etch and plasma mode for removal of organic surface contamination.Automatic slow venting at Used Denton Vacuum Desk II Versatile highvacuum R&D and pilot production thin film magnetron sputtering system.Graphical user

Frequently Asked Questions Sputtering Components

The vapor then condenses on a substrate to produce a thin film coating. Theatoms from the target cross the vacuum chamber and are precisely . Withmagnetron sputtering, magnetic fields increase plasma density for a Oxygen (O2) – deposition of oxide films (e.g. Al2O3, SiO2, TiO2, HfO2, ZrO2, Nb2O5, AZO,ITO).

Sputter systems, sputtering targets and vacuum process equipment

From FHR you can buy vacuum coating equipment and sputtering targets. FHRAnlagenbau is a manufacturer and supplier of magnetron sputtering systems as Inline type systems with PVD and plasma-CVD deposition on rigid substratesto

Arc Reduction in Magnetron Sputtering of - Advanced Energy

intense, localized concentrations of plasma supported by collective reactiveprocesses [2,3]. Properly chosen Vacuum Technology & Coating ? October2007.

Sputter deposition - Wikipedia

Sputter deposition is a physical vapor deposition (PVD) method of thin filmdeposition by Sputter coating in scanning electron microscopy is a sputterdeposition process to cover Sputtering sources often employ magnetrons thatutilize strong electric and The plasma can also be sustained at a lowerpressure this way.

1“ Compact RF Plasma Magnetron Sputtering Coater - MTI KOREA

VTC-1RF is a desktop 1“ single head RF Plasma magnetron sputtering system DC/RF Dual-Head High Vacuum 2” Magnetron Plasma Sputtering Coater with

Overview on modern vacuum web coating technology

ration, magnetron sputtering and plasma enhanced chemical 2. Basics ofvacuum web coating systems. The basics of evaporation technique andsputtering.

Sputtering Systems at Best Price in India - IndiaMART

RF Plasma Magnetron Sputtering Coater for Non Conductive Film This is acompact 2" single head RF Plasma magnetron sputtering system coating non-metallic, mianly 1. Vacuum Sputtering and Thermal Deposition System : HV-VCST.

Related Products


contact us