VTC-600-2HD is a compact magnetron sputtering system with dual 2" targetsources, e.g., one DC source for coating metallic film, and the other RF source for
VTC-16-D is a Desktop Magnetron Plasma Sputtering Coater with a 2" targethead and height adjustable sample holder, which is designed for coating various
VTC-16-SM is a High Power Desktop Magnetron Plasma Sputtering Coater witha water cooling 2" target head, water chiller and rotatable sample holder.
Combinatorial Plasma Sputtering Coater with Three 2'' magnetron Singlephase 220 VAC 50 / 60 Hz; 2000 W (including vacuum pump and water chiller).
VTC-2RF is a compact 2“ single head RF Plasma magnetron sputtering system 220 VAC, 50/60Hz, single phase; 800 W (including pump); If the voltage is 110
Results 1 - 9 of 9 3 Heads Compact 1" RF Plasma Magnetron Sputtering Coater, with DC DC/RFDual-Head High Vacuum 2” Magnetron Plasma Sputtering
VTC-3RF is a three head 1" RF Plasma magnetron sputtering system Vacuumlevel: 1.0E-2 Torr with included dual stage mechanical pump (Click the picture
The 4-inch high vacuum magnetron sputter source can be used to sputter both DC/RF Dual-Head High Vacuum 2” Magnetron Plasma Sputtering Coater
The HVMSS-SPC-2 is a 2" diam. circular magnetron sputtering gun which can 2" High Vacuum Magnetron Sputter Source with Flexible Head & QuickConnector . DC/RF Dual-Head High Vacuum 2” Magnetron Plasma SputteringCoater
Feb 8, 2012 greater than the ambient pressure, and (ii) those involving ionic sputtering sputter coating is a vacuum process: low pressures are required (i) to .impedance of the plasma to drop and the magnetron source operates at
Nov 26, 2016 Diagram of the DC Magnetron Sputtering Process The basic configuration of aDC Sputtering coating system is the target material to be used as a coating isplaced in a vacuum chamber parallel to the substrate to be coated. in the -2 to -5 kV range is then applied to the target coating material that is the
Magnetron Sputtering. ? Vacuum Solar energy distribution at sea level for airmass = 2. S p e ctra . plasma created above the target surface. ?Sputter Sputter Coating Machine. Vacuum. Chamber. Vacuum Pumps. Process Gas.Cathode.
Cold Deposition/Etch Sputter Coater for SEM Sample Preparation. Does not have Etch and plasma mode for removal of organic surface contamination.Automatic slow venting at Used Denton Vacuum Desk II Versatile highvacuum R&D and pilot production thin film magnetron sputtering system.Graphical user
The vapor then condenses on a substrate to produce a thin film coating. Theatoms from the target cross the vacuum chamber and are precisely . Withmagnetron sputtering, magnetic fields increase plasma density for a Oxygen (O2) – deposition of oxide films (e.g. Al2O3, SiO2, TiO2, HfO2, ZrO2, Nb2O5, AZO,ITO).
From FHR you can buy vacuum coating equipment and sputtering targets. FHRAnlagenbau is a manufacturer and supplier of magnetron sputtering systems as Inline type systems with PVD and plasma-CVD deposition on rigid substratesto
intense, localized concentrations of plasma supported by collective reactiveprocesses [2,3]. Properly chosen Vacuum Technology & Coating ? October2007.
Sputter deposition is a physical vapor deposition (PVD) method of thin filmdeposition by Sputter coating in scanning electron microscopy is a sputterdeposition process to cover Sputtering sources often employ magnetrons thatutilize strong electric and The plasma can also be sustained at a lowerpressure this way.
VTC-1RF is a desktop 1“ single head RF Plasma magnetron sputtering system DC/RF Dual-Head High Vacuum 2” Magnetron Plasma Sputtering Coater with
ration, magnetron sputtering and plasma enhanced chemical 2. Basics ofvacuum web coating systems. The basics of evaporation technique andsputtering.
RF Plasma Magnetron Sputtering Coater for Non Conductive Film This is acompact 2" single head RF Plasma magnetron sputtering system coating non-metallic, mianly 1. Vacuum Sputtering and Thermal Deposition System : HV-VCST.