Compact Magnetron Plasma Sputtering Coater with substrate heater

Compact Magnetron Plasma Sputtering Coater With Substrate Heater Lab Pvd Machine , Find Complete Details about Compact Magnetron Plasma Sputtering Coater With Substrate Heater Lab Pvd Machine,Compact Magnetron Plasma Sputtering Coater,Lab Pvd Machine,Plasma Sputtering Machine from Metal Coating

Mini PVD Station - Welcome to :: MILMAN THIN FILM SYSTEMS

System configuration can be changed quickly by changing source / substrate flanges while the suitable operating software can be run from appropriate flash drive. Main Features; Typical Application. Compact standalone Table Top model; Universal platform to provide for. Magnetron Sputtering Technology; Plasma

Plasma Sputtering Coaters

Results 1 - 9 of 9 MTI provides all types of compact sputtering coater, such as RF sputtering and DC plasma sputtering coaters. Compact DC Magnetron Sputtering Coater With Gold Target for Noble Metal Coating - VTC-16-D. Sale Price: USD Coater w. Substrate Heater (500 °C) Including 3 Targets - VTC-16-3HD-LD.

USA vacuum coating systems in vacuum-guide

Mustang Vacuum Systems manufactures vacuum coating / metallizing equipment , including sputtering machines, optical coating units, batch metallizers, and LabTop? 3000: Compact Bench Top Coating System for Laboratory, R&D, and Short-Run Production Coating Substrate Heaters Custom Deposition Systems

Nexdep | Angstrom Engineering | Your Thin Film Partner

It can be outfitted with the most robust process enhancements without taking up all the room in your lab or your budget. 4 iterations of With its 400mm x 400mm baseplate, your Nexdep can accomodate up to 8 sources and wide variety of PVD processes. Physical vapor deposition substrate stage with a heating bulb.

Thin Film Vacuum Deposition System / PVD Vacuum Plating Machine

Nano Science & Technology Company - offering Thin Film Vacuum Deposition System / Pvd Vacuum Plating Machine, Pvd Coating Machine at Rs 4000000 / unit in Our products can do PVD Coating, Pulsed laser deposition (PLD), Magnetron sputtering plating and Thermal evaporation plating with all kinds of chamber

sputtering systems - singulus technologies ag

Rotatable cylindrical magnetrons for highest utilization of target material. > Sputtering materials: ITO, AZO and metals like. Ag, NiV, Cu, Al etc. > Single end and double end version selectable. > Manual or semi-automated lab versions on request. GENERIS PVD Inline Sputtering Systems with Horizontal Substrate Transport.

Deposition Equipment | New and Used Semiconductor Equipment

Listings 1 - 24 of 126 SpectraLab Scientific Inc. OS' PPD (Pulsed Plasma Deposition) Twin Spark Standard System is a Research THIN FILMS DEPOSITION EQUIPMENT. PPD Twin Denton Desktop Pro Sputtering System The Desktop Pro provides high performance sputtering in a compact and economical system.

portable sputter coater - JCM

MINI PVD STATION. MAIN FEATURES. □. COMPACT STAND ALONE TABLE TOP MODEL. □. UNIVERSAL PLATFORM TO PROVIDE FOR o. MAGNETRON SPUTTERING TECHNOLOGY o. PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION o. REACTIVE ION ETCHING o. PLASMA ASHING o. PLASMA SURFACE

China High Power DC Magnetron Plasma Coating Equipment for

China High Power DC Magnetron Plasma Coating Equipment for ITO Glass, Find details about China Plasma Coating Equipment, Lab Scale Sputtering Machine from High Power DC Magnetron Plasma One panel for all parameters monitor and control: vacuum, current, target position, substrate heating temperature.

Society of Vacuum Coaters - Corporate Sponsor Profiles

Multizone and multiprocess machines to build up multiple layers on a single substrate are a specialty. Sputtering machines can be supplied with planar magnetrons or rotatable magnetrons for DC or reactive AC sputtering processes. Recent developments include the introduction of a robust and efficient plasma treatment

MB-ProVap-3 - MBraun

MB-ProVap vacuum deposition system offers glovebox integrated or stand alone coating of rigid substrates under vacuum conditions. The rectangular shaped chamber offers additional space for more sources and optional upgrades such as substrate heating and advanced masking solutions. Due to the design additional

Coating Systems - Ezzi Vision

Coating Systems. Magnetron sputtering is a highly versatile technology for thin film deposition. Running at typical pressures in the 5x10-3 mbar range and using Ar gas, it employs a glow discharge or plasma generated by a purpose-made high negative-voltage power supply to generate gas ions which bombard the surface

Deposition, Coating, Cleaning & Etching Processing Equipment

Deposition technologies available include sputter magnetrons (DC, pulsed DC, mid frequency, and RF); Chemical Vapor Deposition (CVD); and Plasma Enhanced Chemical Vapor Deposition (PECVD). Infrared substrate heating is available as an option, as well as chill drum cooling. Intellivation also offers an affordable

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