12 Nov 2015 The EQ-TFCAS Film & Coating Thickness Measurement Systems provide a non- contact solution to analyze thin films and coatings* with thickness from 200nm to 110
Avantes instruments and fiber-optic sampling tools enable spectroscopic reflectometry measurements to support applications in a variety of industries from semiconductor to solar and optical coating measurements. Avantes thin film solutions provide low cost measurement systems for single and multi-layer thin films on a
This miniaturization requires ultra thin film capabilities along with reliable measurement methods in order to ensure expected performance and quality while still maintaining cost efficiencies. In addition to the overall need generated by the increase of smaller components, additional benefits of ultra thin films include (but
1 Jan 2014 This capability will have many important applications which include measurements on optical coatings, displays, semiconductor devices, transparent conducting oxides and thin film photovoltaics. In this paper we report measurements of thin film thickness made using coherence correlation interferometry on
We offer a complete line of film thickness measurement systems that can measure from 5 nm to 200 μm for analysis of single layer and/or multilayer films in less than a Polymers, Semiconductors (Si, aSi, polySi), Hard coatings (SiC, DLC), Polymer coatings (Paralene, PMMA, Polyamides), thin metal films and many more.
We have significant knowledge of materials testing requirements for powder coatings, polymers, aerosols, adhesives, specialty coatings, paints, inks, toners, lacquers, multilayer systems, laminates, thin-films, hot melt and sealants. We work with many new and advanced coating materials such as graphene, nanomaterials,
8 Apr 2014 Microsoft Excel can extend the capabilities of optical thin-film design and measurement software through its functions, programming environment, and universal connectivity.
Optimax has a range of thin film coating technologies available that can be tailored to best satisfy each customer's requirements. World class high laser damage threshold coatings for CW and pulsed applications; The ability to deterministically correct coating uniformity on curved surfaces; Shift free, durable coatings
Alluxa's thin film optical filter technology has advanced to the point where the spectral slopes and blocking levels are challenging even the best metrology equipment The types of filters which require this measurement capability include those with particularly rapid changes in transmission, such as deep notches, narrow
The HELIX Spectral Analysis System has redefined measurement capabilities of high performance thin-film optical filters. transmission to OD6 (-60 dB), wide- range blocking beyond OD6, and ultra-narrow filters with sub-nanometer bandwidths has driven recent advancements in thin-film design and coating technologies.
Capability of measuring a wide range of materials. ? Highly repeatable measurements. ? Roughness and step-height analysis in one measurement. ? Film thickness and interfacial surface measurement capability. Coherence Correlation Interferometry (CCI). Figure 1: Schematic of a scanning interferometer system.
In addition, the ability to measure functional properties simultaneously at these length scales has become a key aspect of thin film engineering for targeted applications. AFM provides critical information in the development, optimization, and monitoring of thin film growth processes, and in rationalizing design pathways to
Full Optical Capabilities—From Polishing and Coating to System Integration. Manufacturing methods that result in <100-nm TTV across 75-mm diameters; State-of-the-art metrology that can measure optical thickness accuracies to ±1- nm; Adhesive-free bonding—Chemically Activated Direct Bonding? (CADB)— that is
AJ Thin Films has many years experience in all aspects of the thin film industry, from thin film design and process development, through to production Working in collaboration with a company in the optical design layout and associated coatings for a spectral measurement system; Thin film design support for a novel
etching, RF sputter bias and reactive sputtering capabilities. — Pulsed DC sputtering also available on two systems. — Current reactive sputter systems offer O2, Analysis capabilities. ? Analysis of thin film stress ex-situ using. Flexus Tencor laser curvature measuring device. ? In-situ analysis of thin film stress using. MOSS
multi-layer coatings (up to 100 layers); thin films (theoretically down to 1 angstroem*); thick films (theoretically unlimited*); with intrinsic/thermal stresses and gradients of it With regard to measurement analysis it practically depends on capabilities (e.g. the resolution and noise floor) of your measurement instrument.
Metallization Coatings Dielectric Enhancement Allows Higher Reflectance Than Achievable with Bare Metals; Ability to Solder Metal to Glass; Enhancement of a Single Wavelength or Over a Broad Range Scanning White Light Interferometery enables II-VI Optical Systems to Analyze and Measure Metal Film Thickness